Author: Harrison, M.A.
Paper Title Page
TUPB085 Multi-Diagnostic Transverse Profile Monitor Chamber for Extreme Ultraviolet Lithography 554
 
  • T.J. Campese, R.B. Agustsson, M.A. Harrison, B.T. Jacobson, A.Y. Murokh, A.G. Ovodenko, M. Ruelas, H.L. To
    RadiaBeam, Santa Monica, California, USA
  • M.G. Fedurin, I. Pogorelsky, T.V. Shaftan
    BNL, Upton, Long Island, New York, USA
 
  Funding: DOE SBIR Grant No DE-SC0007703
RadiaBeam Technologies has developed a compact transverse beam profile measurement system for the Extreme Ultraviolet Lithography (EUL) experiment at the Brookhaven National Laboratory-Accelerator Test Facility (BNL-ATF). The EUL experiment requires fine e-beam and laser alignment across multiple passes. To accomplish this, the system consists of four profile monitor diagnostics: Interaction Point (IP), upstream, downstream, and a sub-micron resolution diagnostic 11.5 mm downstream of the IP. Care was taken in the design to minimize footprint, avoid possible diagnostic collisions, and maximize ease of assembly and alignment. This paper will review the requirements for the dimensional and optical constraints and solutions for this experiment.
 
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