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TY - CPAPER AU - Campese, T.J. AU - Agustsson, R.B. AU - Fedurin, M.G. AU - Harrison, M.A. AU - Jacobson, B.T. AU - Murokh, A.Y. AU - Ovodenko, A.G. AU - Pogorelsky, I. AU - Ruelas, M. AU - Shaftan, T.V. AU - To, H.L. TI - Multi-Diagnostic Transverse Profile Monitor Chamber for Extreme Ultraviolet Lithography J2 - Proc. of International Beam Instrumentation Conference (IBIC2015), Melbourne, Australia, 13-17 September 2015 AB - RadiaBeam Technologies has developed a compact transverse beam profile measurement system for the Extreme Ultraviolet Lithography (EUL) experiment at the Brookhaven National Laboratory-Accelerator Test Facility (BNL-ATF). The EUL experiment requires fine e-beam and laser alignment across multiple passes. To accomplish this, the system consists of four profile monitor diagnostics: Interaction Point (IP), upstream, downstream, and a sub-micron resolution diagnostic 11.5 mm downstream of the IP. Care was taken in the design to minimize footprint, avoid possible diagnostic collisions, and maximize ease of assembly and alignment. This paper will review the requirements for the dimensional and optical constraints and solutions for this experiment. PB - JACoW CY - Geneva, Switzerland SP - 554 EP - 556 KW - diagnostics KW - laser KW - electron KW - target KW - experiment DA - 2016/01 PY - 2016 SN - 978-3-95450-176-2 DO - 10.18429/JACoW-IBIC2015-TUPB085 UR - http://accelconf.web.cern.ch/AccelConf/IBIC2015/papers/tupb085.pdf ER -