ANL, Argonne, Illinois, USA
University of Illinois at Chicago, Chicago, USA
SINAP, Shanghai, People’s Republic of China
Dynamic mirror benders which enable high precision figuring of planar substrates for x-ray focusing are widely used as conventional optical equipment in various synchrotron radiation beamlines. Especially, in cases for x-ray focusing optics coated with multilayers in a Kirkpatrick-Baez configuration as the final focusing elements immediately upstream of the sample, the dynamic mirror benders provide high precision figuring to allow the mirror figure to be tuned to optimize the focusing at different incidence angles to cover a wide energy range *. Recently, collaboration between Argonne National Laboratory and Shanghai Institute of Applied Physics (SINAP) has produced designs of a new miniature dynamic mirror bender with Argonne’s laminar nanopositioning flexure technique ** for beamline upgrade project at the Shanghai Synchrotron Radiation Facility (SSRF). The mechanical design and finite element analyses of the miniature dynamic mirror bender, as well as its initial mechanical test results with laser interferometer are described in this paper.
* R. Barrett, J. Härtwig, C. Morawe et al, Synchrotron Radiation News, 23, No.1, 36-42(2010)
** U.S. Patent granted No. 6,984, 335, D. Shu, T. S. Toellner, and E. E. Alp, 2006.
ANL, Argonne, Illinois, USA
University of Illinois at Chicago, Chicago, USA
Nanopositioning techniques present an important capability to support the state-of-the-art synchrotron radiation instrumentation research for the APS operations and upgrade project. To overcome the performance limitations of precision ball-bearing-based or roller-bearing-based linear stage systems, two compact linear nanopositiioning flexure stages have been designed and developed at the APS with centimeter-level travel range and nanometer-level resolution for x-ray experimental applications. The APS T8-54 linear flexure stage is designed to perform a precision wire scan as a differential aperture for the 3-D diffraction microscope at the APS sector 34, and the APS T8-56 linear flexure stage is designed for a horizontal sample scanning stage for a hard x-ray microscope at the APS sector 2. Both linear flexure stages are using a similar improved deformation compensated linear guiding mechanism which was developed initially at the APS for the T8-52 flexural linear stage *. The mechanical design and finite element analyses of the APS T8-54 and T8-56 flexural stages, as well as its initial mechanical test results with laser interferometer are described in this paper.
* U.S. Patent granted No. 8,957, 567, D. Shu, S. Kearney, and C. Preissner, 2015.