| Paper | Title | Page |
|---|
| TU103 | Review of High Field Q-slope, Surface Measurements | 75 |
| | - A. Romanenko
CLASSE, Cornell University
| |
| | High field Q-slope remains one of the main physics
problems in the field of niobium radio frequency superconductivity,
which needs to be addressed. Mild temperature
baking at 100-120 degree C in ultra high vacuum for about
48 hours was empirically found to improve or completely
remove the high field Q-slope in niobium cavities. One of
the approaches to tackle the problem is to utilize surface
analytical techniques such as XPS, SIMS, EBSD etc. in
order to look for mechanisms underlying baking-induced
improvement and clues for the high field Q-slope origin.
In this paper current results of surface studies are reviewed
and their implications are discussed. | |
 | Slides(PDF) | |
| TUP24 | Studies of the high field anomalous losses in small and large grain niobium cavities | 173 |
| | - A. Romanenko, G. Eremeev, D. Meidlinger, H. Padamsee
CLASSE, Cornell University
| |
| | High field Q-slope in niobium cavities of all grain sizes
remains to be an unexplained phenomenon. Thermometry
studies performed in recent years revealed that distribution
of losses in the high field Q-slope regime is not uniform,
but exhibit a patchy character with some regions being hotter
than other. Results of surface analysis of samples dissected
from "hot" and "cold" regions of small and large
BCP cavities are reported in this contribution. | |
| TUP49 | ECR Plasma Cleaning: An In-situ Processing Technique for RF Cavities | 243 |
| | - G. Wu, H. Jiang, T. Khabiboulline, I. Pechenezhskiy, T. Koeth, J. Reid, W. Muranyi, B. Tennis, E. Harms, Y. Terechkine, H. Edwards, D. Mitchell, A. Rowe, C. Boffo, C. Cooper, L. Cooley, R. Schuessler
Fermilab - W. -D. Moeller
DESY Hamburg - C. Antoine
CEA-Saclay - A. Romanenko
Cornell University
| |
| | A condition for Electron Cyclotron Resonance (ECR)
can be established inside a fully assembled RF cavity
without the need for removing high-power couplers. As
such, plasma generated by this process can be used as a
final cleaning step, or as an alternative cleaning step in
place of other techniques. We will describe the current
effort to study plasma cleaning by ECR in a 3.9GHz
cavity. | |