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Shinoe, K.

Paper Title Page
RPPE040 Development of Copper Coated Chamber for Third Generation Light Sources 2633
 
  • H. Sakai, I. Ito, H. Kudo, N. Nakamura, S. Shibuya, K. Shinoe, H. Takaki
    ISSP/SRL, Chiba
  • K. Kobayashi
    KEK, Ibaraki
 
  For the 3rd generation light sources, it is essential to reduce the beam instability in order to produce the highly bright synchrotron light much stably. Especially, to avoid the coupled bunch instability, the resistive wall impedance must be reduced. The copper-coating inner surface of the chamber(especially in insertion device section)is much effective method for the reduction of the resistive wall impedance, whose method was already proposed by our group (N.Nakamura et.al., EPAC 1998 p984). We have already produced the copper coated chamber. In this paper, we describe the measurement of the outgassing from the copper coated chamber to evaluate if this chamber is valid on the ultra-low high vacuum condition.