Author: Blick, R.H.
Paper Title Page
THPAB320 ALD-Based NbTiN Studies for SIS R&D 4420
 
  • I. González Díaz-Palacio, R.H. Blick, R. Zierold
    University of Hamburg, Hamburg, Germany
  • W. Hillert, M. Wenskat
    University of Hamburg, Institut für Experimentalphysik, Hamburg, Germany
  
  Su­per­con­duc­tor-In­su­la­tor-Su­per­con­duc­tor mul­ti­lay­ers im­prove the per­for­mance of SRF cav­i­ties pro­vid­ing mag­netic screen­ing of the bulk cav­ity and lower sur­face re­sis­tance. In this frame­work NbTiN mix­tures stand as a po­ten­tial ma­te­r­ial of in­ter­est. Atomic layer de­po­si­tion (ALD) al­lows for uni­form coat­ing of com­plex geome­tries and en­ables tun­ing of the sto­i­chiom­e­try and pre­cise thick­ness con­trol in sub-nm range. In this talk, we re­port about NbTiN thin films de­posited by plasma-en­hanced ALD on in­su­lat­ing AlN buffer layer. The de­po­si­tion process has been op­ti­mized by study­ing the su­per­con­duct­ing elec­tri­cal prop­er­ties of the films. Post-de­po­si­tion ther­mal an­neal­ing stud­ies with vary­ing tem­per­a­tures, an­neal­ing times, and gas at­mos­pheres have been per­formed to fur­ther im­prove the thin film qual­ity and the su­per­con­duct­ing prop­er­ties. Our ex­per­i­men­tal stud­ies show an in­crease in Tc by 87.5% after ther­mal an­neal­ing and a max­i­mum Tc of 13.9 K has been achieved for NbTiN of 23 nm thick­ness. Fu­ture steps in­clude lat­tice char­ac­ter­i­za­tion, using XRR/XRD/EBSD/PALS, and SRF mea­sure­ments to ob­tain Hc1 and the su­per­con­duct­ing gap.  
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-IPAC2021-THPAB320  
About • paper received ※ 24 May 2021       paper accepted ※ 23 July 2021       issue date ※ 18 August 2021  
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