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| TUPMP029 |
Establishing a Laser Treatment to Suppress the Secondary Electron Emission |
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| SUSPFO071 |
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- Y.G. Wang, X.Q. Ge, X.T. Pei, S.W. Wang, Y. Wang, B. Zhang, B.L. Zhu
USTC/NSRL, Hefei, Anhui, People’s Republic of China
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Laser treatment has a significant inluent on suppressing the secondary electron emission(SEE). The new synchrotron radiation light source, the Hefei Advanced Light Source(HALS) has a strict requirement on the SEE. In this paper, we used a 355nm laser to process copper sample. After the laser treatment, the secondary electron yield(SEY) reduced from 2.05 to 0.86. We used the scanning electron microscope(SEM) to analysis the surface of sample after the laser treatment.
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| DOI • |
reference for this paper
※ https://doi.org/10.18429/JACoW-IPAC2019-TUPMP029
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| About • |
paper received ※ 30 April 2019 paper accepted ※ 22 May 2019 issue date ※ 21 June 2019 |
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