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RIS citation export for TUPMP029: Establishing a Laser Treatment to Suppress the Secondary Electron Emission

TY  - CONF
AU  - Wang, Y.G.
AU  - Ge, X.Q.
AU  - Pei, X.T.
AU  - Wang, S.W.
AU  - Wang, Y.
AU  - Zhang, B.
AU  - Zhu, B.L.
ED  - Boland, Mark
ED  - Tanaka, Hitoshi
ED  - Button, David
ED  - Dowd, Rohan
ED  - Schaa, Volker RW
ED  - Tan, Eugene
TI  - Establishing a Laser Treatment to Suppress the Secondary Electron Emission
J2  - Proc. of IPAC2019, Melbourne, Australia, 19-24 May 2019
CY  - Melbourne, Australia
T2  - International Particle Accelerator Conference
T3  - 10
LA  - english
AB  - Laser treatment has a significant inluent on suppressing the secondary electron emission(SEE). The new synchrotron radiation light source, the Hefei Advanced Light Source(HALS) has a strict requirement on the SEE. In this paper, we used a 355nm laser to process copper sample. After the laser treatment, the secondary electron yield(SEY) reduced from 2.05 to 0.86. We used the scanning electron microscope(SEM) to analysis the surface of sample after the laser treatment.
PB  - JACoW Publishing
CP  - Geneva, Switzerland
SP  - 1303
EP  - 1305
KW  - laser
KW  - electron
KW  - experiment
KW  - synchrotron
KW  - focusing
DA  - 2019/06
PY  - 2019
SN  - 978-3-95450-208-0
DO  - DOI: 10.18429/JACoW-IPAC2019-TUPMP029
UR  - http://jacow.org/ipac2019/papers/tupmp029.pdf
ER  -