Author: Battam, N.W.
Paper Title Page
TUPHA190 Adaptations to CS-Studio for Use at Diamond Light Source 880
 
  • W.A.H. Rogers, N.W. Battam, T.M. Cobb, M.J. Furseman, G. Knap
    DLS, Oxfordshire, United Kingdom
  
  Con­trol Sys­tem Stu­dio (CS-Stu­dio) is one of the most widely-used dis­play man­agers for EPICS. It is based on the Eclipse Rich Client Plat­form (Eclipse RCP), al­low­ing for co­her­ent in­te­gra­tion of in­ter­faces for dif­fer­ent sys­tems with com­mon graph­i­cal el­e­ments and pref­er­ences. How­ever, this user in­ter­face pre­sents a dif­fer­ent way of work­ing to those from the pre­vi­ous gen­er­a­tion of EPICS tools such as Ex­ten­si­ble Dis­play Man­ager (EDM) and Strip­tool. At Di­a­mond Light Source, EDM has been used since com­mis­sion­ing in two dif­fer­ent ways: for ma­chine op­er­a­tions and for beam­line con­trols. Both uses of EDM will even­tu­ally be re­placed with CS-Stu­dio and sig­nif­i­cant ef­fort has been put into this tran­si­tion. Two kinds of change proved nec­es­sary: adap­ta­tions to CS-Stu­dio it­self, and changes to the typ­i­cal user work­flows. This paper pre­sents both types of changes that were needed to make CS-Stu­dio a pro­duc­tive tool at Di­a­mond.  
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-ICALEPCS2017-TUPHA190  
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