WEAO05
NFRI, Daejon, Republic of Korea
*H. J. You, S. O. Jang, Y. H. Jung, and B. J. Lee, "Microwave Antenna for Generating Plasma", U.S. Patent 8 648 534, February, 2014.
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WEAO05 |
SMASHI and MeLA ECR Ion Source at NFRI: One for Highly-Charged Ions and the Other for High Current Metal Ions | |
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There are two type of ECR ion sources at NFRI. One is SMASHI(Superconducting Multi-Application Source of Highly-charged Ions), and the other MeLA(Magnet-embedded Lisitano Antenna) ion source. They are developed for highly-charged ions(HCI) and high current metal ions(HCMI) generation, respectively. Firstly, SMASHI is a 18 GHz superconducting ECR ion source, which will be dedicated for future application of HCIs and matter interaction. SMASHI is featuring a liquid helium-free SC magnet having fast-excitation capability(>0.1 A/s) of coils, two frequency heating(18, 18+Δ GHz), remotely-positional variable gap extraction system, and two diagnostic ports for the extraction region. Secondly, MeLA ion source is a scalable high current(>10 mA) metal ion source. the MeLA*, originally developed for a large-area microwave ECR plasma source for semiconductor processing by our group, is able to generate high density uniform ECR plasma by a waveguide directly-coupled and permanent Magnet-embedded Lisitano Antenna. In this presentation we describe design aspects of the sources in detail, and then their performance results are provided.
*H. J. You, S. O. Jang, Y. H. Jung, and B. J. Lee, "Microwave Antenna for Generating Plasma", U.S. Patent 8 648 534, February, 2014. |
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Slides WEAO05 [47.317 MB] | |
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