<xml>
  <records>
    <record>
       <contributors>
          <authors>
             <author>Kato, S.</author>
             <author>Hayano, H.</author>
          </authors>
       </contributors>
       <titles>
          <title>
             Plasma-enhanced ALD System for SRF Cavity
          </title>
       </titles>
		 <publisher>JACoW</publisher>
       <pub-location>Geneva, Switzerland</pub-location>
		 <isbn>978-3-95450-191-5</isbn>
		 <electronic-resource-num>10.18429/JACoW-SRF2017-THPB055</electronic-resource-num>
		 <language>English</language>
		 <pages>870-872</pages>
       <pages>THPB055</pages>
       <keywords>
          <keyword>ion</keyword>
          <keyword>cavity</keyword>
          <keyword>niobium</keyword>
          <keyword>plasma</keyword>
          <keyword>SRF</keyword>
       </keywords>
       <work-type>Contribution to a conference proceedings</work-type>
       <dates>
          <year>2018</year>
          <pub-dates>
             <date>2018-01</date>
          </pub-dates>
       </dates>
       <urls>
          <related-urls>
              <url>https://doi.org/10.18429/JACoW-SRF2017-THPB055</url>
              <url>http://jacow.org/srf2017/papers/thpb055.pdf</url>
          </related-urls>
       </urls>
       <abstract>
          A remote PEALD (Plasma-enhanced Atomic Layer Deposition) system which would offer a high conformality and a low deposition temperature has been being developed for deposition of NbN on an SRF cavity. The deposition equipment consists of a deposition chamber, a remote plasma exciter, a precursor supply system, vacuum pumps, a quartz crystal microbalance (QCM) as a film growth rate meter, a detoxifying system and a safety system. An RF frequency of 13.56MHz was used for the inductively coupled plasma exciter of a reactant gas. The whole equipment is in a draft booth for operation safety. For ALD of an SRF cavity, the ALD system allows us to easily replace the deposition chamber with a single cell Nb cavity. The prepared precursors are tris[ethylmethylamido][tert-butylimido] niobium (TBTEMN) and trimethylaluminium (TMA). Ammonia, hydrogen and water are also prepared as reactants. We will report the ALD system design and result of the NbN deposition on sample coupons which are analysed with SEM, EDX and XPS.
       </abstract>
    </record>
  </records>
</xml>
