Paper | Title | Page |
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TUP17 | Preliminary Results on "Polarized" Buffered Chemical Polishing of a Large Grain Niobium Cavity | 154 |
| - G. Ciovati
JLab - S. G. Corcoran
Virginia Tech - J. Halbritter
Forschungszentrum Karlsruhe
| |
| In order to further understand the relation between the
high-field Q-drop and the native oxide layer on the
surface of SRF niobium cavities, we tried to alter the
oxidation of niobium by applying a small voltage between
a large-grain niobium cavity and a niobium rod inserted in
the center, during buffered chemical polishing (BCP). The
cavity RF test results at 1.7 K and 2.0 K did not show any
major difference in the Q-drop behavior, compared to a
standard BCP treatment. In one case, dark gray regions
were visible inside the cavity and were responsible for
additional losses, as seen with temperature maps. In order
to better understand the electrochemical process occurring
during the "polarized" BCP treatment, measurements of
the polarization curve have been made on a cylindrical
niobium sample, with a cylindrical niobium rod in the
center. | |
WE104 | Novel Characterization of the Electropolishing of Niobium with Sulfuric and Hydrofluoric Acid Mixtures | 370 |
| - H. Tian, M. J. Kelley
TJNAF and College of William and Mary - S. G. Corcoran
Virginia Tech - C. E. Reece
TJNAF
| |
| Niobium surfaces are commonly electropolished in an
effort to obtain optimally smooth surfaces for high-field
SRF cavity applications. We report the first use of
controlled electrochemical analysis techniques to
characterize electropolishing of Nb in a sulfuric and
hydrofluoric acid electrolyte. Through the use of a
reference electrode we are able to clearly distinguish the
anode, cathode polarization potentials as well as the
electrolyte voltage drop that sum to the applied power
supply voltage. We then separate the temperature and HF
concentration dependence of each. We also report the first
use of Electrochemical Impedance Spectroscopy (EIS) on
this system. EIS results are consistent with a presence of a
compact salt film at the Nb/electrolyte interface that is
responsible for the limiting current. Microscopic
understanding of the basic Nb EP mechanism is expected
to provide an appropriate foundation with which to
optimize the preparation of high-field niobium cavity
surfaces. The implication of EIS for monitoring Nb
surface during electropolishing shows this technology
could be potentially used as a source of on-line feedback. | |
 | Slides(PDF) | |