| Paper | Title | Page |
|---|
| WE204 | Application of plasma cleaning to cavities processing | 400 |
| | - N. Patron, S. Deambrosis, S. Stark, V. Palmieri
INFN-LNL - M. Baecker
Fachhochschule Aachen - L. Phillips
TJLNAF
| |
| | very versatile and inexpensive technique used in a variety
of surface processes such as dry etching, surface
treatments and modification of surface wettability. After
initial studies on different configurations of RF, MW and
DC atmospheric plasma devices we have analyzed the
modification of water wettability induced by helium
atmospheric plasma.
We have applied a resonance atmospheric plasma
cleaning step to further clean a 6 GHz Nb seamless cavity
observing an increment in the Q0 from 7x1e6 to 2x1e7 in
only 30 minutes of process. The increased wettability due
to the plasma action on the inner cavity surface has
proved to enhance the beneficial action of water rinsing
pushing the Q0 value further up close to 3x1e7. | |
 | Slides(PDF) | |