Author: Floettmann, K.     [Flöttmann, K.]
Paper Title Page
MOPPA005 Laser-Wakefield Acceleration with External Bunch Injection at REGAE 254
 
  • J. Grebenyuk, K. Flöttmann
    DESY, Hamburg, Germany
  • T. Mehrling, J. Osterhoff
    Uni HH, Hamburg, Germany
 
  Funding: Helmholtz Alliance
Short and highly intense laser pulses focused into a gas target, ionise the gas and may excite large amplitude plasma waves that support extreme electric fields (>10 GV/m) for acceleration of charged particles. The REGAE facility at DESY, which provides 2-5 MeV of ~10 fs bunches, offers the unique possibility to study the external injection of pre-accelerated electron bunches from a conventional accelerator, and their subsequent acceleration in plasma wakefields. Simulations were performed with the particle-in-cell code OSIRIS, showing a wide variety of effects which can be explored in the future at REGAE. External controlled injection allows to study effects which require precise information about the beam quality, position and momentum at the initial point of injection. Topics of a particular interest are: bunch emittance growth suppression, controlled betatron motion, and longitudinal bunch compression.
 
 
WEPPD012 Standing Wave RF Deflectors with Reduced Aberrations 590
 
  • V.V. Paramonov, L.V. Kravchuk, P. Orlov
    RAS/INR, Moscow, Russia
  • K. Flöttmann
    DESY, Hamburg, Germany
 
  Funding: in part RBFR N 12-02-00654-a
Deflecting structures are now widely used for bunch phase space manipulations either with bunch rotation for special bunch diagnostic or in emittance exchange experiments. Even if the field of synchronous harmonic is aberration free, the higher space harmonics provide non linear additives in the field distribution, leading to emittance growth during phase space manipulation. Standing wave operation is more RF efficient for short deflectors. The criterion of the field quality estimation and results is of deflecting structure consideration for minimization of non linear additives are presented. The solutions for dispersion correction together with end cells optimization are described too.