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Ivanov, A.V.

Paper Title Page
MOMP04

 200 KeV Pulsed Electron Beam Source For The VEPP-5 Injection Complex 

  • V.E.Akimov, A.V.Ivanov, I.V.Kazarezov, A.A.Korepanov, IA.V.Kulenko, G.I.Kuznetsov, M.I.Tiunov
    Budker Institute of Nuclear Physics, Novosibirsk, Russia

The pulsed electron beam source on voltage 200 kV and current 10 A with half-height pulse duration 3 ns is described. The gun is based on the dispenser cathode with 20 mm diameter. The current control is performed by means of molybdenum grid with the cell size 0.4x0.4 mm and optical transparency of about 0.7. The numerical optimization of cathode-grid unit is carried out. The experimental results obtained are in good agreement with project parameters.

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