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Hale, J.W.

Paper Title Page
RPAP024 The ORNL Multicharged Ion Research Facility (MIRF) High Voltage Platform Project 1853
 
  • F.W. Meyer, M.E. Bannister, J.W. Hale, J.W. Johnson
    ORNL, Oak Ridge, Tennessee
  • D. Hitz
    CEA Grenoble, Grenoble
 
  Funding: This research was sponsored by the Office of Basic Energy Sciences, and the Office of Fusion Energy Sciences of the U.S. DOE under contract No. DE-AC05-00OR22725 with UT-Battelle, LLC.

We report on initial testing and implementation of a new high voltage platform recently installed at the ORNL MIRF. The platform is powered by a 250 kV, 30 kVA isolation transformer and features an all permanent magnet Electron Cyclotron Resonance (ECR) ion source, designed and fabricated at CEA/Grenoble, that utilizes microwave power levels of up to 750W in the frequency range 12.75 – 14.5 GHz to provide intense dc beams of singly and multiply charged ions for acceleration to energies up to 270 x q keV. The primary application of these ion beams is to study fundamental collisional interactions* of multicharged ions with electrons, atoms, and surfaces. More applied investigations in the area of ion implantation,** and ion beam development for use in semiconductor doping operations are carried out as well. Design details of the HV platform and the associated beamline-switchyard will be presented at the conference, together with performance characteristics of the all permanent magnet ECR source, of the beam transport from ion source to end-station, and of a novel electrostatic spherical sector beam switcher for directing beam to the various on-line experiments.

*F.W . Meyer, Trapping Highly Charged Ions: Fundamentals and Applications, J. Gillaspy, ed., Nova Science Pub., New York, 2000, pp. 117-164. **F. W. Meyer et al., AIP Conf. Proc. 635, p. 125 (2002).