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@InProceedings{liu:napac2019-tuyba4,
author = {A. Liu and P.V. Avrakhov and C. Jing and R.A. Kostin},
title = {{Optimization of an SRF Gun Design for UEM Applications}},
booktitle = {Proc. NAPAC'19},
pages = {305--308},
paper = {TUYBA4},
language = {english},
keywords = {SRF, gun, laser, cavity, electron},
venue = {Lansing, MI, USA},
series = {North American Particle Accelerator Conference},
number = {4},
publisher = {JACoW Publishing, Geneva, Switzerland},
month = {10},
year = {2019},
issn = {2673-7000},
isbn = {978-3-95450-223-3},
doi = {10.18429/JACoW-NAPAC2019-TUYBA4},
url = {http://jacow.org/napac2019/papers/tuyba4.pdf},
note = {https://doi.org/10.18429/JACoW-NAPAC2019-TUYBA4},
abstract = {Benefiting from the rapid progress on RF photocathode gun technologies in the past two decades, the development of MeV-range ultrafast electron diffraction/microscopy (UED and UEM) has been identified as an enabling instrumentation, which may lead to breakthroughs in fundamental science and applied technologies *. Euclid is designing an SRF cavity as the UEM electron gun. As implementing a solenoid for emittance compensation in the gun is limited by the superconductivity performance and available space, the geometry of the first 0.3 cell of the cavity is optimized for transverse focusing and emittance reduction.},
}