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| THPOA33 |
A Preliminary Beam Impedance Model of the Advanced Light Source Upgrade at LBL |
1174 |
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- S. Persichelli, J.M. Byrd, S. De Santis, D. Li, T.H. Luo, J.R. Osborn, C.A. Swenson, M. Venturini, Y. Yang
LBNL, Berkeley, California, USA
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The proposed upgrade of the Advanced Light Source (ALS-U) consists of a multi-bend achromat ultralow emittance lattice optimized for the production of diffraction-limited soft x-rays. A narrow-aperture vacuum chamber is a key feature of the new generation of light sources, and can result in a significant increase in the beam impedance, potentially limiting the maximum achievable beam current. While the conceptual design of the vacuum system is still in a very early development stage, this paper presents a preliminary estimate of the beam impedance using a combination of electromagnetic simulations and analytical calculations. We include the impedance of cavities, select vacuum-chamber components and resistive wall in a multi-layered beam chamber with NEG coating.
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| DOI • |
reference for this paper
※ https://doi.org/10.18429/JACoW-NAPAC2016-THPOA33
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