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@inproceedings{anton:medsi2020-tupc09,
author = {J.W.J. Anton and M. Chu and Z. Jiang and S. Narayanan and D. Shu and J. Strzalka and J. Wang},
% author = {J.W.J. Anton and M. Chu and Z. Jiang and S. Narayanan and D. Shu and J. Strzalka and others},
% author = {J.W.J. Anton and others},
title = {{Progress of Nano-Positioning Design for the Coherent Surface Scattering Imaging Instrument for the Advanced Photon Source Upgrade Project}},
booktitle = {Proc. MEDSI'20},
pages = {196--198},
eid = {TUPC09},
language = {english},
keywords = {photon, alignment, detector, laser, scattering},
venue = {Chicago, IL, USA},
series = {Mechanical Engineering Design of Synchrotron Radiation Equipment and Instrumentation},
number = {11},
publisher = {JACoW Publishing, Geneva, Switzerland},
month = {10},
year = {2021},
issn = {2673-5520},
isbn = {978-3-95450-229-5},
doi = {10.18429/JACoW-MEDSI2020-TUPC09},
url = {https://jacow.org/medsi2020/papers/tupc09.pdf},
note = {https://doi.org/10.18429/JACoW-MEDSI2020-TUPC09},
abstract = {{As part of the Advanced Photon Source Upgrade (APS-U) project, the Coherent Surface Scattering Imaging (CSSI) [1] instrument is currently being developed. One of the most important components of the CSSI instrument at the 9-ID beamline of the APS-U, the Kirkpatrick-Baez (K-B) mirror system, will focus hard X-rays to a diffrac-tion-limited size of 500 nanometers at a working distance of 550 mm. High angular stability (19 nrad for the hori-zontal mirror and 14 nrad for the vertical mirror) is speci-fied no just for the focused beamsize but, more important-ly, to ensure the beam stability at the detector position that is up to 24 m from the K-B mirrors. A large sample-to-detector distance (up to 23 m), one of the beamline’s unique features for achieving a sufficient coherent-imaging spatial oversampling, requires sample angular stability of 50 nrad. In CSSI scattering geometry, the vertically placed sample reflects X-rays in the horizontal direction at an extremely shallow angle. The design in-cludes two high-precision rotary stages for sample pitch (vertical axis) and yaw (horizontal axis). The current design of instrument’s nano-positioning stages [2] and metrology required to satisfy the stability and positioning requirements are discussed in this paper.}},
}