Author: Tanaka, H.
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WEPE13
Design and Performance Evaluation of the Next Generation Beamlines at New KEK Light Source (KEK-LS)  
 
  • N. Igarashi, K. Amemiya, T. Kikuchi, T. Mori, Y. Takeichi, H. Tanaka, Y. Uchida
    KEK, Tsukuba, Japan
 
  KEK has been operating two SR sources, the PF-ring and the PF-AR, for about thirty years. We have made a proposal of constructing a new SR facility, tentatively called KEK light source (KEK-LS). An extremely low-emittance storage ring based on the hybrid multi-bend achromatic (HMBA) lattice has been designed as a successor of the aged two rings. The undulator brightness almost approaches 1022 or exceeds 1022 in the soft X-ray to hard X-ray region. It is higher by two orders of magnitude than those of present 3rd generation light sources and by four orders from the PF-ring. The coherent fractions reach 10 % and 1 % at 1 keV and 10 keV, respectively. The KEK-LS will serve as the platform to advance the frontier of science using nanobeam, high-energy resolution beam and high coherent beam. We are conducting necessary studies to fully utilize the high brilliance beams emitted from KEK-LS. We designed beamline optics systems at 1 keV and 10 keV, respectively, and evaluated the beam performance. Also, we are making careful considerations as for the state-of-the-art technology of optics elements. Here, we present the typical beamline designs and the performance by lay-tracing simulations.  
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WEPE19
Present Status of PF BL-13A/B, Vacuum Ultraviolet and Soft X-Ray Undulator Beamlines for Surface Chemistry and STXM  
 
  • K. Mase, K. Amemiya, T. Kikuchi, Y. Takeichi, H. Tanaka, A. Toyoshima
    KEK, Tsukuba, Japan
  • T. Miyazawa
    Sokendai, The Graduate University for Advanced Studies, Tsukuba, Japan
 
  An APPLE-II-type variable polarization undulator was installed at BL-13A/B in Photon Factory (PF) in the end of FY2014, and the user experiments were started in FY2015. Photon flux at BL-13 increased by nearly one order of magnitude compared to the previous one. BL-13A is mainly used for scanning transmission X-ray microscopy (STXM) measurements, while BL-13B is mainly dedicated to surface science using angle-resolved photoelectron spectroscopy (ARPES), high resolution X-ray photoelectron spectroscopy (HR-XPS), and X-ray absorption spectroscopy (XAS) [*]. Present status of PF BL-13A/B will be presented in the poster.
* A. Toyoshima, H. Tanaka, T. Kikuchi, K. Amemiya, and K. Mase, J. Vac. Soc. Jpn., 54 (2011) 580
 
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