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RIS citation export for SPWR021: Study Progress of Pulse Laser Annealing for Niobium Film on Copper

TY  - CONF
AU  - Yang, Y.
AU  - Li, B.T.
AU  - Lu, X.Y.
AU  - Tan, W.W.
AU  - Xiao, L.
AU  - Xie, D.
AU  - Yang, D.Y.
ED  - Pei, Guoxi
ED  - Schaa, Volker RW
ED  - Chin, Yong Ho
ED  - Fu, Shinian
ED  - Zhao, Ning
TI  - Study Progress of Pulse Laser Annealing for Niobium Film on Copper
J2  - Proc. of LINAC2018, Beijing, China, 16-21 September 2018
CY  - Beijing, China
T2  - Linear Accelerator Conference
T3  - 29
LA  - english
AB  - The recent studies of laser annealing on niobium films on copper are reported. Annealing is normally used to deal with the surface, reducing defects and even chang-ing the microstructure of the coating film. Short pulse laser can produce a sharp step temperature field on the film thickness scale (μm), which anneals the surface without substrate heated. The laser annealing experi-ments of niobium thin film sample have been carried out, and according to SEM and FIB results, Nb films melted and recrystallization occurred. Grains growing up can be observed while the power density of laser pulse in-creased.
PB  - JACoW Publishing
CP  - Geneva, Switzerland
SP  - 438
EP  - 441
DA  - 2019/01
PY  - 2019
SN  - 2226-0366
SN  - 978-3-95450-194-6
DO  - DOI: 10.18429/JACoW-LINAC2018-TUPO048
UR  - http://jacow.org/linac2018/papers/tupo048.pdf
ER  -