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TY - CONF AU - Ge, X.Q. AU - Li, W. AU - Shao, J.Q. AU - Wang, S. AU - Wang, Y. AU - Wang, Y.G. AU - Wei, W. AU - Zhang, B. AU - Zhang, Y.X. ED - Boland, Mark ED - Tanaka, Hitoshi ED - Button, David ED - Dowd, Rohan ED - Schaa, Volker RW ED - Tan, Eugene TI - Comparison of TiZrV Non-evaporable Getter Films Deposited by DC Magnetron Sputtering or Quantitative Deposition J2 - Proc. of IPAC2019, Melbourne, Australia, 19-24 May 2019 CY - Melbourne, Australia T2 - International Particle Accelerator Conference T3 - 10 LA - english AB - Ti-Zr-V non-evaporable getter (NEG) films have been widely used in vacuum chambers of various accelerators since their discovery. Recently, we have used a new method called ’quantitative deposition’ to deposit Ti-Zr-V NEG films on nichrome substrates. The surface morphology and surface chemical bonding information were collected by scanning electron microscopy. Although the film deposited by DC magnetron sputtering has more uniform grain growth, smoother grain boundaries and higher porosity, the two films all have porous network structure and can be used as getter films. PB - JACoW Publishing CP - Geneva, Switzerland SP - 1283 EP - 1285 KW - vacuum KW - site KW - target KW - interface KW - electron DA - 2019/06 PY - 2019 SN - 978-3-95450-208-0 DO - DOI: 10.18429/JACoW-IPAC2019-TUPMP021 UR - http://jacow.org/ipac2019/papers/tupmp021.pdf ER -