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RIS citation export for TUPMP021: Comparison of TiZrV Non-evaporable Getter Films Deposited by DC Magnetron Sputtering or Quantitative Deposition

TY  - CONF
AU  - Ge, X.Q.
AU  - Li, W.
AU  - Shao, J.Q.
AU  - Wang, S.
AU  - Wang, Y.
AU  - Wang, Y.G.
AU  - Wei, W.
AU  - Zhang, B.
AU  - Zhang, Y.X.
ED  - Boland, Mark
ED  - Tanaka, Hitoshi
ED  - Button, David
ED  - Dowd, Rohan
ED  - Schaa, Volker RW
ED  - Tan, Eugene
TI  - Comparison of TiZrV Non-evaporable Getter Films Deposited by DC Magnetron Sputtering or Quantitative Deposition
J2  - Proc. of IPAC2019, Melbourne, Australia, 19-24 May 2019
CY  - Melbourne, Australia
T2  - International Particle Accelerator Conference
T3  - 10
LA  - english
AB  - Ti-Zr-V non-evaporable getter (NEG) films have been widely used in vacuum chambers of various accelerators since their discovery. Recently, we have used a new method called ’quantitative deposition’ to deposit Ti-Zr-V NEG films on nichrome substrates. The surface morphology and surface chemical bonding information were collected by scanning electron microscopy. Although the film deposited by DC magnetron sputtering has more uniform grain growth, smoother grain boundaries and higher porosity, the two films all have porous network structure and can be used as getter films.
PB  - JACoW Publishing
CP  - Geneva, Switzerland
SP  - 1283
EP  - 1285
KW  - vacuum
KW  - site
KW  - target
KW  - interface
KW  - electron
DA  - 2019/06
PY  - 2019
SN  - 978-3-95450-208-0
DO  - DOI: 10.18429/JACoW-IPAC2019-TUPMP021
UR  - http://jacow.org/ipac2019/papers/tupmp021.pdf
ER  -