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RIS citation export for THPMP013: Challenges Towards Industrialization of the ERL-FEL Light Source for EUV Lithography

AU  - Nakamura, N.
AU  - Kako, E.
AU  - Kato, R.
AU  - Kawata, H.
AU  - Miyajima, T.
AU  - Sakai, H.
AU  - Umemori, K.
ED  - Boland, Mark
ED  - Tanaka, Hitoshi
ED  - Button, David
ED  - Dowd, Rohan
ED  - Schaa, Volker RW
ED  - Tan, Eugene
TI  - Challenges Towards Industrialization of the ERL-FEL Light Source for EUV Lithography
J2  - Proc. of IPAC2019, Melbourne, Australia, 19-24 May 2019
CY  - Melbourne, Australia
T2  - International Particle Accelerator Conference
T3  - 10
LA  - english
AB  - EUV Lithography is going to HVM (high volume manufacturing) stage with 250-W-class laser-produced plasma sources and it is important to develop a new-type EUV light source to meet future demand for higher power. Energy-recovery linac based free-electron lasers (ERL-FELs) are possible candidates of a high-power EUV light source that can distribute 1 kW power to multiple scanners simultaneously. In Japan, an ERL-FEL based EUV light source has been designed using available technologies without much development to demonstrate generation of EUV power more than 10 kW and the EUV-FEL Light Source Study Group for Industrialization has been established since 2015 to realize industrialization of the light source and the related items. For industrialization, high availability is essential as well as high power and reduction of the light source size is also required. In this paper, we will report an overview of the designed ERL-FEL light source for EUV lithography and some activities for the industrialization and describe considerations and developments for obtaining high availability and size reduction of the light source.
PB  - JACoW Publishing
CP  - Geneva, Switzerland
SP  - 3478
EP  - 3481
KW  - cavity
KW  - cathode
KW  - undulator
DA  - 2019/06
PY  - 2019
SN  - 978-3-95450-208-0
DO  - DOI: 10.18429/JACoW-IPAC2019-THPMP013
UR  - http://jacow.org/ipac2019/papers/thpmp013.pdf
ER  -