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TY - CONF AU - Lorbeer, B. AU - Baboi, N. AU - Duhme, H.T. AU - Neumann, Re. ED - Koscielniak, Shane ED - Satogata, Todd ED - Schaa, Volker RW ED - Thomson, Jana TI - High Resolution and Low Charge Button and Strip-Line Beam Position Monitor Electronics Upgrade at Flash J2 - Proc. of IPAC2018, Vancouver, BC, Canada, April 29-May 4, 2018 C1 - Vancouver, BC, Canada T2 - International Particle Accelerator Conference T3 - 9 LA - english AB - Historically the FLASH (Free Electron Laser in Hamburg) facility at DESY (Deutsches Elektronen-Synchrotron) in Germany has foreseen operation in a charge range from 1nC-3nC for which a VME based BPM(Beam Position Monitor) system has been in operation since 2005. For a couple of years the standard machine operation has been settled at a few hundreds of pC with the tendency for smaller charges down to 100pC and smaller. The availability and resolution performance of the BPM system at charges below 300pC in many locations along the machine was unsatisfactory. In the last couple of years a new BPM electronic system based on the utca standard has been developed to overcome these limitations. A substantially improved version of the analog frontend and digital electronics has been developed in 2016 and tested successfully. During shutdown works at FLASH in summer 2017 all old button and strip-line BPM electronics has been replaced with the new type of electronics. This paper summarizes the features and performance of the new BPM system, compares the beam jitter free resolution of old and new BPM system and highlights its high single shot resolution of better than 10um at a charge of 15pC. PB - JACoW Publishing CP - Geneva, Switzerland SP - 1923 EP - 1926 KW - electron KW - electronics KW - FEL KW - laser KW - operation DA - 2018/06 PY - 2018 SN - 978-3-95450-184-7 DO - 10.18429/JACoW-IPAC2018-WEPAF048 UR - http://jacow.org/ipac2018/papers/wepaf048.pdf ER -