The Joint Accelerator Conferences Website (JACoW) is an international collaboration that publishes the proceedings of accelerator conferences held around the world.
TY - CONF AU - Ge, X.Q. AU - He, T.L. AU - Pei, X.T. AU - Wang, Y. AU - Wang, Y.G. AU - Wei, W. AU - Zhang, B. AU - Zhang, Y.X. ED - Koscielniak, Shane ED - Satogata, Todd ED - Schaa, Volker RW ED - Thomson, Jana TI - Deposition and Characterization of TiZrHfV films by DC Magnetron Sputtering J2 - Proc. of IPAC2018, Vancouver, BC, Canada, April 29-May 4, 2018 C1 - Vancouver, BC, Canada T2 - International Particle Accelerator Conference T3 - 9 LA - english AB - The new generation of accelerators places higher demands on the surfaces of vacuum chamber materials. Search for low secondary electron yield (SEY) materials and an effective vacuum chamber surface treatment process, which can effectively reduce the electronic cloud effect, are important early works for the new generation of accelerators. In this work, we revealed the SEY characteristics of Ti-Zr-Hf-V NEG films and Ti-Zr-V NEG films which were deposited on Si (111) substrates using direct current magnetron sputtering method. The surface morphology and surface chemical bonding information were collected by scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). With the same parameters, the maximum SEY of Ti-Zr-Hf-V NEG films and Ti-Zr-V NEG films are 1.24 and 1.51, respectively. These results are of great significance for the next-generation particle accelerators. PB - JACoW Publishing CP - Geneva, Switzerland SP - 4983 EP - 4985 KW - vacuum KW - electron KW - controls KW - storage-ring KW - target DA - 2018/06 PY - 2018 SN - 978-3-95450-184-7 DO - 10.18429/JACoW-IPAC2018-THPML129 UR - http://jacow.org/ipac2018/papers/thpml129.pdf ER -