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RIS citation export for THPML128: Production and Secondary Electron Yield Test of Amorphous Carbon Thin Film

TY - CONF
AU - Zhang, Y.X.
AU - Ge, X.Q.
AU - Wang, S.W.
AU - Wang, Y.
AU - Wei, W.
AU - Zhang, B.
ED - Koscielniak, Shane
ED - Satogata, Todd
ED - Schaa, Volker RW
ED - Thomson, Jana
TI - Production and Secondary Electron Yield Test of Amorphous Carbon Thin Film
J2 - Proc. of IPAC2018, Vancouver, BC, Canada, April 29-May 4, 2018
C1 - Vancouver, BC, Canada
T2 - International Particle Accelerator Conference
T3 - 9
LA - english
AB - Amorphous carbon (a-C) thin film applied to vacuum chambers of high-energy particle accelerators can decrease secondary electron yield(SEY)and suppress electron-cloud effectively. A dc magnetron sputtering apparatus to obtain a-C film has been designed. With the equipment, a-C thin film can be deposited on the inner face of stainless steel pipes ultimately which is uniform and high-quality. Meanwhile, it is found that a-C has a low SEY<1.2 measured by the secondary electron emission measurement set-up in the National Synchrotron Radiation Laboratory. The result indicates that a-C is an ideal material for modern accelerators.
PB - JACoW Publishing
CP - Geneva, Switzerland
SP - 4980
EP - 4982
KW - electron
KW - vacuum
KW - synchrotron
KW - synchrotron-radiation
KW - site
DA - 2018/06
PY - 2018
SN - 978-3-95450-184-7
DO - 10.18429/JACoW-IPAC2018-THPML128
UR - http://jacow.org/ipac2018/papers/thpml128.pdf
ER -