| Paper |
Title |
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| THPMY011 |
Chamber Upgrade for EPU48 in TPS |
3676 |
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- I.C. Sheng, C.K. Chan, C.-C. Chang, C.M. Cheng, Y.T. Cheng, J. -Y. Chuang, Y.M. Hsiao, Y.T. Huang, C. Shueh, L.H. Wu, I.C. Yang
NSRRC, Hsinchu, Taiwan
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Due to high total power and power density in Taiwan Photon Source (TPS) of EPU48 (Elliptical Polarized Undulator) in double minimum sector, we fabricate a new Aluminum vacuum chamber to increase sufficient room for synchrotron radiation to pass through without damage the storage ring chamber. A new method of in-site replacement of bending chamber is also presented, the result of this replacement procedure shows that it is very cost-effective as well as good UHV vacuum quality.
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| THPMY014 |
Study of the Non-evaporable Ti-Zr-V Films Grown on Different Materials |
3682 |
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- L.H. Wu, C.M. Cheng, Y.T. Huang, S.Y. Perng, I.C. Sheng, C. Shueh
NSRRC, Hsinchu, Taiwan
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The non-evaporable (NEG) Ti-Zr-V films were coated on the different vacuum-chamber materials, including the extruded aluminum samples (Al), the extruded seamless stainless steel samples (S.S.), CuCrZr alloys, and oxygen-free copper (OFC) plates. The NEG films were fabricated by using the direct current (DC) sputtering method. The secondary electron microscopy images showed that the morphology of NEG films was different on these various substrates. The thermal analysis (TA) presented that exothermic reaction happened by heating the samples.
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