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Adaptive 3-D UV-laser Pulse Shaping System to Minimize Emittance for Photocathode RF Gun
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- T. Asaka, H. Dewa, H. Hanaki, T. Kobayashi, A. Mizuno, S. Suzuki, T. Taniuchi, K. Yanagida, H. T. Tomizawa
JASRI/SPring-8, Hyogo-ken
- F. Matsui
Industrial Technology Center of Fukui, Fukui City
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We developed an adaptive 3-D shaping (both temporal (1D) and spatial (2D)) short pulse (80 fs~40 ps) UV-laser system as an ideal light source for yearlong stable generation of a low emittance electron beam with a high charge (1~2 nC/pulse). In its current form, the laser’s pulse-energy stability has been improved to 0.2~0.3% (rms; 10 pps, 0.4 TW in femtosecond operation) at the fundamental wavelength and 0.7~1.4% at the third-harmonic generation. Such improvement reflects an ability to stabilize the laser system in a humidity-controlled clean room. The pulse-energy stability of a mode-locked femtosecond oscillator has been continuously held to 0.3% (p-p) for 10 months, 24 hours a day. In addition, the ideal spatial and temporal profiles of a shot-by-shot single UV-laser pulse are essential to suppress emittance growth in an RF gun. We apply a deformable mirror that automatically shapes the spatial UV-laser profile with a feedback routine, based on a genetic algorithm, and a pulse stacker for temporal shaping at the same time. The 3D shape of the laser pulse is spatially top-hat (flattop) and temporally a square stacked pulse. Using a 3D-shaped laser pulse with a diameter of 0.8 mm on the cathode and pulse duration of 10 ps (FWHM), we obtain a minimum normalized emittance of 1.4 π mm mrad with beam energy of 26 MeV.
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Slides
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