| Paper |
Title |
Page |
| WEPP08 |
Development of Compact H+ ECR Ion Source with Pulse Gas Valve |
98 |
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- Y. Fuwa, Y. Iwashita, H. Tongu
Kyoto ICR, Uji, Kyoto, Japan
- M. Ichikawa
QST, Tokai, Japan
- N. Miyawaki
QST/Takasaki, Takasaki, Japan
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Compact H+ ECR Ion Source using permanent magnets is under development. A pulsed gas injection system achieved by a piezo gas valve can reduce the gas load to a vacuum evacuation system. This feature is suitable when the ion source is closely located to an RFQ. Results of a performance test will be presented.
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| DOI • |
reference for this paper
※ https://doi.org/10.18429/JACoW-ECRIS2016-WEPP08
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