| Paper | Title | Page |
|---|---|---|
| TUPD19 | Beam Profiling and Measurement at MIBL | 333 |
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Michigan Ion Beam Laboratory (MIBL) is equipped with a 1.7 MV tandem particle accelerator and a 400 KV ion implanter. Ion beams can be produced from a variety of ion sources and delivered to different beamlines. Precise beam profiling and current measurements are critical aspects of everyday activity in the laboratory and influence the success of each experiment. The paper will present the beam simulation software employed and the benefits and the shortcomings of the devices used at MIBL to precisely know all the parameters of the ion beams |