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Suh, H. S.

Paper Title Page
THPMA117 Design and Fabrication of Arups U6 Undulator at PLS 806
 
  • H.-G. Lee, C. W. Chung, H. S. Han, Y. G. Jung, D. E. Kim, W. W. Lee, K.-H. Park, H. S. Suh
    PAL, Pohang, Kyungbuk
 
  Pohang Accelerator Laboratory(PAL) had developed and installed an U6 undulator recently to utilize brilliant undulator radiation for ARUPS (Angle Resolved Ultraviolet Photoemission) beamline at Pohang Light Source (PLS). The U6 is a hybrid type device with period of 6 cm, minimum gap of 18 mm, maximum flux density of 0.85 Tesla and total magnetic structure length of 1830 mm. The support locations and structure of an insertion device are optimized to achieve a minimum deflection due to the magnetic loads. A Finite Element Analysis (FEA) is performed to find out the amount of maximum deflection and optimal support positions on the backing beam. The optimized maximu deflection is estimated to be about 11.6 ?, while the deflection before any optimization is 48.8 ?. In this report, all the mechanical design, fabrication and assembly details of the PLS U6 undulator are described.