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Lakshmy, P. S.

Paper Title Page
WEPMA078 HTS-ECRIS and Low Energy Beam Transport System of the High Current Injector 434
 
  • G. Rodrigues, R. Ahuja, D. Kanjilal, P. Kumar, P. S. Lakshmy, A. Mandal, Y. Mathur, D. Naik, A. Roy, U. Unnam
    IUAC, New Delhi
 
  A high performance electron cyclotron resonance ion source (ECRIS) called PKDELIS capable of operation at 14.5 and 18 GHz and which uses High Temperature Superconducting (HTS) coils designed jointly by IUAC, Delhi (earlier called NSC), Pantechnik, Caen and ISN, Grenoble is presently in operation. The source is very suitable for operation on a 400 kV high voltage platform for injecting beams from the High Current Injector (HCI) into the Superconducting Linear Accelerator Booster. In the low energy beam transport (LEBT) system of the HCI, the beam extraction and transport becomes more and more challenging. In order to avoid the losses of the beam, the complete transport system is being made as short as possible. In addition, due to the high currents (~10 mA) extracted, the extraction system needs proper cooling requirements and possibility of movement of the electrodes for tuning various A/q beams. Typical axial and radial bremstraahlung spectra have been measured from the ECR plasma. Details will be discussed and further measurements are being explored to obtain a better understanding.  
THPMA089 Studies of Metallic Ion Beams using ECRIS 770
 
  • P. Kumar, D. Kanjilal, P. S. Lakshmy, G. Rodrigues
    IUAC, New Delhi
 
  Low energy metallic ion beams find wide applications in various research fields especially in materials science, atomic and molecular physics. Several metallic ion beams have been developed successfully using all permanent magnet 10 GHz electron cyclotron resonance (ECR) ion source based low energy ion beam facility (LEIBF) [*] at IUAC. The most important feature of the facility is that the source and all its peripheral components including electronics and vacuum systems are on a high voltage platform (300 kV).The metallic ion beams were developed by different methods e.g. oven, sputtering, insertion and metal ions using volatile compounds (MIVOC). The ion source has been tuned to get optimum intensities of metallic ion beams. The high intensities of low charge state metallic ion beams are suitable to engineer the materials for optical, electrical and structural properties via ion implantation. For the interest of atomic and molecular physics, the high intensities of highly charged metallic ion beams are produced using gas mixing [**] and bias techniques. The charge state distribution studies of various metallic ion beams and gas mixing effect of different gases are presented.

[*] P. Kumar et.al., Nucl. Instr. and Meth. B, 440 (2006) 246.[**] A. G. Drentje et.al., Rev. Sci. Instrum. 953 (1996) 67.