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Fujino, T.
Paper
Title
Page
SRF97C08
Achievement of 40 MV/m Accelerating Field in L- Band SCC at KEK
472
M. Ono
, E. Kako, S. Noguchi, K. Saito, T. Shishido, H. Inoue,
T. Fujino
KEK, Ibaraki-Ken
H. Umezawa, K. Takeuchi
Tokyo Denkai Co. Ltd., Tokyo
T. Suzuki, T. Higuchi
Nomura Plating Co. Ltd., Tochigi-ken
SRF97D02
Superiority of Electropolishing over Chemical Polishing on High Gradients
795
K. Saito
, H. Inoue, E. Kako,
T. Fujino
, S. Noguchi, M. Ono, T. Shishido
KEK, Ibaraki-ken