DESY, Hamburg
INFN-Roma II, Roma
Thin TiN layers on surfaces of RF components have the ability to reduce secondary electron emission and multipactor effects. A new equipment was designed and built for mass production at DESY to generate TiN films by depostion of Ti vapor in low pressure ammonia ambience. This new setup was already transferred to industry for the XFEL RF coupler fabrication. The technical layout of the apparatus and results of REM/EDX surface analysis will be presented.
