Author: Surles-Law, K.E.L.
Paper Title Page
WEODS3 CEBAF 200 kV Inverted Electron Gun 1501
 
  • J.M. Grames, P.A. Adderley, J. Clark, J. Hansknecht, M. Poelker, M.L. Stutzman, R. Suleiman, K.E.L. Surles-Law
    JLAB, Newport News, Virginia, USA
  • M. BastaniNejad
    Old Dominion University, Norfolk, Virginia, USA
  • J.L. McCarter
    UVa, Charlottesville, Virginia, USA
 
  Funding: Authored by Jefferson Science Associates, LLC under U.S. DOE Contract No. DE-AC05-06OR23177. In addition, DOE-HEP funds this work in support of the ILC R&D program.
Two DC high voltage GaAs photoguns have been built at Jefferson Lab based on a compact inverted insulator design. One photogun provides the polarized electron beam at CEBAF and operates at 130 kV bias voltage. The other gun is used for high average current lifetime studies at a dedicated test facility and has been operated at bias voltage up to 225 kV. The advantages of higher DC voltage for CEBAF include reduced space-charge emittance growth and the potential for prolonged photocathode lifetime. However, a consequence of operating at higher voltages is the increased likelihood of field emission or breakdown, both of which are unacceptable. Highlights of the R&D studies leading toward a production 200keV GaAs photogun for CEBAF will be presented.
 
slides icon Slides WEODS3 [1.360 MB]