• H.S. Wang, T.C. Tseng, D.-J. Wang, P.S. Yaw
  NSRRC, Hsinchu

A low run-out rotating sample stage is under development to realize a precise resolution within 30 nm on the horizontal plane for the end-station of transmission X-ray microscope (TXM) at NSRRC. The main assembly consists of a commercial rotation stage with run-out less than 1 μm, six capacitive sensors, one master ball, one flat and a horizontal adjusting stage. Error sources (including the profile of the master ball, run-out of the master ball in horizontal and vertical directions, flat plate) are separated from stage and the sensor readings can be down to the nanometer level. A feedback method is proposed to compensate the systematic errors and keeps the samples with little run-out and axial motion in the level of several tens nanometer. The details and tests of the rotation stage are presented in this paper.