A   B   C   D   E   F   G   H   I   J   K   L   M   N   O   P   Q   R   S   T   U   V   W   X   Y   Z  

Ha, Y.

Paper Title Page
TU5PFP002 Atomic Layer Deposition for SRF Cavities 803
 
  • J. Norem, J.W. Elam, M.J. Pellin
    ANL, Argonne
  • C.Z. Antoine
    CEA, Gif-sur-Yvette
  • G. Ciovati, P. Kneisel, C.E. Reece, R.A. Rimmer
    JLAB, Newport News, Virginia
  • L. Cooley
    Fermilab, Batavia
  • A.V. Gurevich
    NHMFL, Tallahassee, Florida
  • Y. Ha, Th. Proslier, J. Zasadzinski
    IIT, Chicago, Illinois
 
 

Funding: DOE/OHEP


We have begun using Atomic Layer Deposition (ALD) to synthesize a variety of surface coatings on coupons and cavities as part of an effort to produce rf structures with significantly better performance and yield than those obtained from bulk niobium, The ALD process offers the possibility of conformally coating complex cavity shapes with precise layered structures with tightly constrained morphology and chemical properties. Our program looks both at the metallurgy and superconducting properties of these coatings, and also their performance in working structures. Initial results include: 1) evidence from point contact tunneling showing magnetic oxides can be a significant limitation to high gradient operation, 2) experimental results showing the production sharp niobium/oxide interfaces from a high temperature bake of ALD coated Al2O3 on niobium surfaces, 3) results from ALD coated structures.