• J. Norem, M. Kharitonov, J. Klug, M.J. Pellin, Th. Proslier
  ANL, Argonne
• N. Becker, J. Zasadzinski
  IIT, Chicago, Illinois
• G. Ciovati
  JLAB, Newport News, Virginia
• A.V. Gurevich
  NHMFL, Tallahassee, Florida

An effort, centered at Argonne, has started to explore the use of Atomic Layer Deposition (ALD) to study and improve the performance of superconducting rf (SRF) accelerating structures. This effort has a number of parts: a survey the properties of ALD deposited films, a study of loss mechanisms of SRF structures, and a program of coating single cell cavities, to begin to optimize the performance of complete systems. Early results have included improving the performance of individual structures and, identification of magnetic oxides as a loss mechanism in SRF. We describe the program and summarize recent progress.