IPAC2011 - List of Authors (von Jagwitz, H.)

Paper	Title	Page
TUPS080	Low Energy Bunching with a Double Gap RF Buncher	1725
	H. von Jagwitz, U. Hagen, O. Heid, S. Setzer Siemens AG, Erlangen, Germany
	A compact double gap bunching system for low energy proton beams is presented. The system is designed for the bunching of a low current proton beam (less than 50μA) with an energy of 10 keV. The buncher operates at 150 MHz and bunches without significantly changing the beam energy. The beam is generated by an Electron Beam Ion Source and has to be bunched for the subsequent acceleration in a 150 MHz linear accelerator. The buncher contains two short gaps and an RF electrode inbetween. Thus the full length of the buncher in the beamline is in the range of 2 cm. The location of the bunch focus depends on the buncher power. The bunched beam was analysed at a distance of 550 mm with a fast faraday cup. The bunching effectivity was determined as 50%, which means that 50% of the protons of the beam were located in bunches with a width of 60°, which is a reasonable value of acceptance for a conventional accelerator cavity. Some theory and detailed results will be presented.

TUPS077	Shaping of Ion Pulses from an Electron Beam Ion Source for Particle Injection into Accelerators	1716
	F. Ullmann, A. Schwan DREEBIT GmbH, Dresden, Germany U. Hagen, O. Heid, H. von Jagwitz Siemens AG, Healthcare Technology and Concepts, Erlangen, Germany G. Zschornack Technische Universität Dresden, Institut für Angewandte Physik, Dresden, Germany
	Electron Beam Ion Sources (EBISs) provide highly charged ions for many applications, amongst others for particle injection into accelerators. Although EBISs are limited in ion output they feature a lot of advantages which qualify them for accelerator injection. The ion pulses extracted from the ion sources can be directly injected into an accelerator sequence which however requires ion pulses with distinct shape and length. We present the production of ion pulses matching the requirements of particle injection. The ions are produced by trapping in a high density electron beam for a certain time with electrostatic potentials providing for their axial trapping. The ions are extracted by lowering the trapping potential, i.e. opening the trap. Due to the ion energy distribution within the trapping region ion extraction can be controlled by controlling the trapping potential. A specific time dependent control mode of the trapping potential thus allows to produce ion pulses with designated shape and length. Source parameters such as working gas pressure, electron beam current and energy are influencing the energy distribution of the ions which in turn is influencing pulse shaping.

Paper

Title

Page

Low Energy Bunching with a Double Gap RF Buncher

1725

H. von Jagwitz, U. Hagen, O. Heid, S. Setzer
Siemens AG, Erlangen, Germany

A compact double gap bunching system for low energy proton beams is presented. The system is designed for the bunching of a low current proton beam (less than 50μA) with an energy of 10 keV. The buncher operates at 150 MHz and bunches without significantly changing the beam energy. The beam is generated by an Electron Beam Ion Source and has to be bunched for the subsequent acceleration in a 150 MHz linear accelerator. The buncher contains two short gaps and an RF electrode inbetween. Thus the full length of the buncher in the beamline is in the range of 2 cm. The location of the bunch focus depends on the buncher power. The bunched beam was analysed at a distance of 550 mm with a fast faraday cup. The bunching effectivity was determined as 50%, which means that 50% of the protons of the beam were located in bunches with a width of 60°, which is a reasonable value of acceptance for a conventional accelerator cavity. Some theory and detailed results will be presented.

TUPS077

Shaping of Ion Pulses from an Electron Beam Ion Source for Particle Injection into Accelerators

1716

F. Ullmann, A. Schwan
DREEBIT GmbH, Dresden, Germany
U. Hagen, O. Heid, H. von Jagwitz
Siemens AG, Healthcare Technology and Concepts, Erlangen, Germany
G. Zschornack
Technische Universität Dresden, Institut für Angewandte Physik, Dresden, Germany

Electron Beam Ion Sources (EBISs) provide highly charged ions for many applications, amongst others for particle injection into accelerators. Although EBISs are limited in ion output they feature a lot of advantages which qualify them for accelerator injection. The ion pulses extracted from the ion sources can be directly injected into an accelerator sequence which however requires ion pulses with distinct shape and length. We present the production of ion pulses matching the requirements of particle injection. The ions are produced by trapping in a high density electron beam for a certain time with electrostatic potentials providing for their axial trapping. The ions are extracted by lowering the trapping potential, i.e. opening the trap. Due to the ion energy distribution within the trapping region ion extraction can be controlled by controlling the trapping potential. A specific time dependent control mode of the trapping potential thus allows to produce ion pulses with designated shape and length. Source parameters such as working gas pressure, electron beam current and energy are influencing the energy distribution of the ions which in turn is influencing pulse shaping.