Author: Ovsyannikov, V.P.
Paper Title Page
TUPS078 Electron Beam Ion Sources – A New Access for Particle Acceleration 1719
 
  • F. Ullmann, F. Grossmann, V.P. Ovsyannikov, A. Schwan
    DREEBIT GmbH, Dresden, Germany
  • G. Zschornack
    Technische Universität Dresden, Institut für Angewandte Physik, Dresden, Germany
 
  Elec­tron Beam Ion Sources (EBISs) pro­duce high­ly charged ions in a high den­si­ty elec­tron beam. Due to their op­er­a­tional prin­ci­ple EBISs have a lot of ad­van­tages al­though lim­it­ed in ion out­put. Since the ra­di­al source re­gion is given by a nar­row elec­tron beam the ex­tract­ed ion beam fea­tures a very low transver­sal emit­tance. More­over, the ions are ion­ized by a mo­noen­er­get­ic elec­tron beam re­sult­ing in a small vari­a­tion of the ion en­er­gy dis­tri­bu­tion, and thus in a very low lon­gi­tu­di­nal emit­tance. To­geth­er with a low basis pres­sure of less than 10-9 mbar this re­sult in a high qual­i­ty ion beam. The ions can be ex­tract­ed as con­tin­u­ous beam as well as ion puls­es with dis­tinct pulse shapes. Pro­vid­ing al­most any el­e­ment with any charge state of up to com­plete­ly ion­ized ions gives a large num­ber of dif­fer­ent pro­jec­tiles and ki­net­ic en­er­gies. The use of EBISs whether based on per­ma­nent mag­nets or on cryo­gen-free su­per­con­duct­ing mag­nets has been proven in a va­ri­ety of fields and ap­pli­ca­tions. In ad­di­tion, their com­pact de­sign makes them trans­portable, low in op­er­a­tional costs, and guar­an­tee easy han­dling.