• C. Steier, B.J. Bailey, A. Biocca, A. Madur, H. Nishimura, G.J. Portmann, S. Prestemon, D. Robin, S.L. Rossi, F. Sannibale, T. Scarvie, D. Schlueter, W. Wan, L. Yang
  LBNL, Berkeley, California

The Advanced Light Source is one of the earliest 3rd generation light sources. With an active upgrade program it has remained competitive over the years. The latest in a series of upgrades is a lattice upgrade project that was started in 2009. When it will be completed, the ALS will operate with a horizontal emittance of 2.2 nm and an effective emittance of 2.6 nm. Combined with the high current of 500 mA and the small vertical emittance the ALS already operates at this upgrade will keep it competitive for years to come. The presentation will present the status of the upgrade, including beam dynamics studies and lattice optimizations as well as the magnet design and status.