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Oh, S.

Paper Title Page
THPEC009 A Gas-filled Capillary Plasma Source for Laser-driven Plasma Acceleration 4071
 
  • H. Suk, D. Jang, D. Jang, M. Kim, S. Oh
    APRI-GIST, Gwangju
 
 

In re­cent years, the laser-driv­en plas­ma wake­field ac­cel­er­a­tion has at­tract­ed much at­ten­tion as it has a much high­er ac­cel­er­a­tion gra­di­ent (>100 GeV/m) com­pared with the RF-based con­ven­tion­al ac­cel­er­a­tors. In the past, the su­per­son­ic gas jet method for plas­ma wake­field ac­cel­er­a­tion was wide­ly used, but this method has a lim­i­ta­tion in ac­cel­er­a­tion dis­tance and en­er­gy be­cause the fo­cused laser beam is diffract­ed severe­ly over a very short dis­tance (~ a few mm range). To avoid the diffrac­tion prob­lem, a cap­il­lary plas­ma source can be used, where a high power laser beam can be guid­ed over a long dis­tance (~ a few cm range) by a parabol­ic plas­ma den­si­ty pro­file in the cap­il­lary plas­ma chan­nel. We have de­vel­oped a gas-filled cap­il­lary plas­ma source for gen­er­a­tion of GeV-lev­el elec­tron beams in col­lab­o­ra­tion with the Uni­ver­si­ty of Ox­ford team. In this pre­sen­ta­tion, the de­tailed test re­sults and the near-fu­ture ex­per­i­men­tal plan for GeV-lev­el e-beam gen­er­a­tion are shown.