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Erickson, M.Y.

Paper Title Page
TUPEA082 Versatile Device for In-situ Discharge Cleaning and Multiple Coatings of Long, Small Diameter Tubes 1509
 
  • A. Hershcovitch, M. Blaskiewicz, J.M. Brennan, W. Fischer, C.J. Liaw, W. Meng
    BNL, Upton, Long Island, New York
  • A.X. Custer, M.Y. Erickson, N.Z. Jamshidi, H.J. Poole
    PVI, Oxnard
  • N. Sochugov
    Institute of High Current Electronics, Tomsk
 
 

Electron clouds, which can limit machine performance, have been observed in many accelerators including RHIC at BNL. They can be suppressed by low secondary electron yield beam pipe surfaces. Additional concern for the RHIC machine, whose vacuum chamber is made from relatively high resistivity 316LN stainless steel, is high wall resistivity that can result in unacceptably high ohmic heating for superconducting magnets. The high resistivity can be addressed with a copper (Cu) coating; a reduction in the secondary electron yield can be achieved with a TiN or amorphous carbon (a-C) coating. Applying such coatings in an already constructed machine is rather challenging. We started developing a robotic plasma deposition technique for in-situ coating of long, small diameter tubes. The technique entails fabricating a device comprising of staged magnetrons mounted on a mobile mole for deposition of about 5 μm (a few skin depths) of Cu followed by about 0.1 μm of a-C. As a first step, a 15-cm Cu cathode magnetron is being designed and fabricated, after which, 30-cm long sample of the RHIC pipe are to be Cu coated. Deposition rates and affects on RF resistivity are to be measured.