Michigan University/MIBL, Ann Arbor
The Michigan Ion Beam Laboratory (MIBL) at the University of Michigan has instruments equipped with ion sources capable of generating a wide variety of ions. The 1.7-MV Tandem accelerator can operate with three different sources: a Torvis source, a Duoplasmatron source and a Sputter source. The 400-kV ion implanter is equipped with a CHORDIS source that can operate in three different modes (gas, sputter, and oven) and is capable of producing ion beams for most of the elements in the periodic table. In this work, we discuss the principle of operation of each source, their performances and the latest applications and projects conducted at MIBL using these sources.
