HB2014 - List of Authors (Takayanagi, T.)

Paper

Title

Page

Pulse-to-pulse Transverse Beam Emittance Controlling for the MLF and MR in the 3-GeV RCS of J-PARC

394

P.K. Saha, H. Harada, H. Hotchi, T. Takayanagi
JAEA/J-PARC, Tokai-Mura, Naka-Gun, Ibaraki-Ken, Japan

The 3-GeV RCS (Rapid Cycling Synchrotron) of J-PARC (Japan Proton Accelerator Research Complex) is a MW-class proton beam source for the muon and neutron production targets in the MLF (Material and Life Science Experimental Facility) as well as an injector for 50-GeV MR (Main Ring). Not only the beam intensity but RCS has to provide two different transverse sizes of the extracted beam for the MLF and MR even in simultaneous operation. Namely, a wider one for the MLF, while a narrower one for the MR. We proposed a pulse-to-pulse direct controlling of the transverse injection painting area so as to ensure a desired extracted beam emittance. The injection system design is capable of changing painting area between MLF and MR. The extracted beam profile for the MR is measured to be sufficiently narrower than that for the MLF and is also shown to be consistent with ORBIT beam simulations. It is thus one remarkable progress in recent high intensity multi-user machine to confirm that the beam parameters can be dynamically controlled and delivered as requested by the users even in simultaneous operation. A detail of both design and experimental studies are presented in this paper.

Slides THO3AB03 [2.225 MB]

Paper	Title	Page
THO3AB03	Pulse-to-pulse Transverse Beam Emittance Controlling for the MLF and MR in the 3-GeV RCS of J-PARC	394
	P.K. Saha, H. Harada, H. Hotchi, T. Takayanagi JAEA/J-PARC, Tokai-Mura, Naka-Gun, Ibaraki-Ken, Japan
	The 3-GeV RCS (Rapid Cycling Synchrotron) of J-PARC (Japan Proton Accelerator Research Complex) is a MW-class proton beam source for the muon and neutron production targets in the MLF (Material and Life Science Experimental Facility) as well as an injector for 50-GeV MR (Main Ring). Not only the beam intensity but RCS has to provide two different transverse sizes of the extracted beam for the MLF and MR even in simultaneous operation. Namely, a wider one for the MLF, while a narrower one for the MR. We proposed a pulse-to-pulse direct controlling of the transverse injection painting area so as to ensure a desired extracted beam emittance. The injection system design is capable of changing painting area between MLF and MR. The extracted beam profile for the MR is measured to be sufficiently narrower than that for the MLF and is also shown to be consistent with ORBIT beam simulations. It is thus one remarkable progress in recent high intensity multi-user machine to confirm that the beam parameters can be dynamically controlled and delivered as requested by the users even in simultaneous operation. A detail of both design and experimental studies are presented in this paper.
	Slides THO3AB03 [2.225 MB]