Author: Sineau, A.
Paper Title Page
MOCOCK01 PK-ISIS: a New Superconducting ECR Ion Source at Pantechnik 26
 
  • A.C.C. Villari, C. Bieth, W. Bougy, B.N. Brionne, X. Donzel, G. Gaubert, R. Leroy, A. Sineau, O. Tasset, C. Vallerand
    PANTECHNIK, BAYEUX, France
  • T. Thuillier
    LPSC, Grenoble, France
  
  The new ECR ion source PK-ISIS was re­cent­ly com­mis­sioned at Pan­tech­nik. Three su­per­con­duct­ing coils gen­er­ate the axial mag­net­ic field con­fig­u­ra­tion while the ra­di­al mag­net­ic field is done with mul­ti-lay­er per­ma­nent mag­nets. Spe­cial care was de­vot­ed in the de­sign of the hexap­o­lar struc­ture, al­low­ing a max­i­mum mag­net­ic field of 1.32 T at the wall of the 82 mm di­am­e­ter plas­ma cham­ber. The three su­per­con­duct­ing coils using Low Tem­per­a­ture Su­per­con­duct­ing wires are cooled by a sin­gle dou­ble stage cryo-cool­er (4.2 K). Cryo­gen-free tech­nol­o­gy is used, pro­vid­ing re­li­a­bil­i­ty, easy main­te­nance at low cost. The max­i­mum in­stalled RF power (18.0 GHz) is of 2 kW. Metal­lic beams can be pro­duced with an oven (Tmax = 1400 °C) in­stalled with an angle of 5° with re­spect to the source axis or a sput­ter­ing sys­tem, mount­ed in the axis of the source. The beam ex­trac­tion sys­tem is con­sti­tut­ed of three elec­trodes in ac­cel-de­cel con­fig­u­ra­tion. De­scrip­tion of the source and re­sults of the mag­net­ic mea­sure­ments will be given. Per­for­mances of the source in terms of beam in­ten­si­ties and charge states dis­tri­bu­tion will be pre­sent­ed.  
slides icon Slides MOCOCK01 [3.226 MB]  
 
TUPOT006 Using Mass-Flow Controllers for Obtaining Extremely Stable ECR Ion Source Beams 127
 
  • X. Donzel, W. Bougy, B.N. Brionne, G. Gaubert, A. Sineau, O. Tasset, C. Vallerand, A.C.C. Villari
    PANTECHNIK, BAYEUX, France
  • R. Leroy
    GANIL, Caen, France
  
  Beam sta­bil­i­ty and re­pro­ducibil­i­ty is of paramount im­por­tance in ap­pli­ca­tions re­quir­ing pre­cise con­trol of im­plant­ed ra­di­a­tion dose, like in the case of Hadron­ther­a­py. The beam in­ten­si­ty over sev­er­al weeks or months should be kept con­stant. More­over, the tim­ing for chang­ing the na­ture of the beam and, as a con­se­quence, the tun­ing of the source should be min­i­mized. Stan­dard valves usu­al­ly used in con­junc­tion of ECR ion sources have the dis­ad­van­tage of con­trol­ling the con­duc­tance, which can vary sig­nif­i­cant­ly with ex­ter­nal con­di­tions, like am­bi­ent tem­per­a­ture and inlet pres­sure of the gas. The use of flow con­trollers is the nat­u­ral way for avoid­ing these ex­ter­nal con­straints. In this con­tri­bu­tion we pre­sent the re­sults ob­tained using a new model of Mass-flow con­troller in the source Su­per­nanogan, for pro­duc­tion of C4+ and H3+ beams. Ex­treme­ly sta­ble beams (± 2.5%) with­out re­tun­ing of the source over sev­er­al weeks could be ob­tained. The re­pro­ducibil­i­ty of the source tun­ing pa­ram­e­ters could also be demon­strat­ed.  
poster icon Poster TUPOT006 [4.386 MB]  
 
TUPOT004 Microgan ECR Ion Source in a Van de Graaff Accelerator Terminal 120
 
  • G. Gaubert, C. Bieth, W. Bougy, B.N. Brionne, X. Donzel, A. Sineau, O. Tasset, C. Vallerand, A.C.C. Villari
    PANTECHNIK, BAYEUX, France
  • C. Chavez-de-Jesus, T. Gamboni, W. Geerts, G. Giorginis, R. Jaime Tornin, G. Lövestam, W. Mondelaers
    JRC/IRMM, Geel, Belgium
  
  The Van de Graaff ac­cel­er­a­tor at IRMM works since many years pro­vid­ing pro­ton, deuteron and he­li­um beams for nu­cle­ar data mea­sure­ments. The orig­i­nal ion source was of RF type with quartz bot­tle. This kind of source, as well known, needs reg­u­lar main­te­nance for which the ac­cel­er­a­tor tank must be com­plete­ly opened. The heavy usage at high cur­rents of the IRMM ac­cel­er­a­tor ne­ces­si­tat­ed an open­ing about once every month. Re­cent­ly, the full per­ma­nent mag­net Mi­cro­gan ECR ion source from PAN­TECH­NIK was in­stalled into a new ter­mi­nal plat­form to­geth­er with a solid state am­pli­fi­er of 50W, a ded­i­cat­ed dos­ing sys­tem for 4 gases (with re­spec­tive gas bot­tles H2, D2, He and Ar), and a set of ded­i­cat­ed power sup­plies and elec­tron­ic de­vices for the re­mote tun­ing of the source. The new sys­tem shows a very sta­ble be­hav­ior of the pro­duced beam al­low­ing run­ning the Van de Graff with­out main­te­nance for sev­er­al months. This con­tri­bu­tion will de­scribe the full in­stalled sys­tem in de­tails (work­ing at high pres­sure in the ter­mi­nal, spark ef­fects and optic of the ex­trac­tion).  
poster icon Poster TUPOT004 [1.715 MB]