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Samolov, A.

Paper Title Page
WEPEC082 Computational Modeling of Muons passing through Gas Pressured RF Cavities 3070
 
  • A. Samolov, A.L. Godunov
    ODU, Norfolk, Virginia
 
 

Using high-pressure RF cavities for muon colliders would provide higher accelerating gradients, that is crucial for fast acceleration of short-living muons .This approach requires a good evaluation for mechanisms of muon - low-Z gas interaction, including such effects as multiple scattering and space charge effects. Most present simulation tools (GEANT4, G4MICE) for muon beams are based on single particle tracking, where collective effects are not taken into account. We use a modified molecular dynamic simulation technique to study effects of both multiple scattering and space charge screening by the gas on scattering, energy loss, and propagation of muons during both ionization cooling and acceleration.

 
WEPEC083 Tomographic Analysis of SRF Cavities as Asymmetric Plasma Reactors 3072
 
  • M. Nikolić, A.L. Godunov, S. Popović, A. Samolov, J. Upadhyay, L. Vušković
    ODU, Norfolk, Virginia
  • H.L. Phillips, A-M. Valente-Feliciano
    JLAB, Newport News, Virginia
 
 

The tomographic reconstruction of local plasma parameters for nonequilibrium plasma sources is a developing approach, which has a great potential in understanding the fundamental processes and phenomena during plasma processing of SRF cavity walls. Any type of SRF cavity presents a plasma rector with limited or distorted symmetry and possible presence of high gradients. Development of the tomographic method for SRF plasma analysis consists of several steps. First, we define the method based on the inversion of the Abel integral equation for a hollow spherical reactor. Second step is application of the method for the actual elliptical cavity shape. Third step consists of study of the effects of various shapes of the driven electrode. Final step consists of testing the observed line-integrated optical emission data. We will show the typical results in each step and the final result will be presented in the form of correlation between local plasma parameter distributions and local etching characteristics.