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Dudnikov, V.G.

Paper Title Page
THPEC071 Highly Polarized Ion Sources for Electron Ion Colliders (EIC) 4220
 
  • V.G. Dudnikov, R.P. Johnson
    Muons, Inc, Batavia
  • Y.S. Derbenev, Y. Zhang
    JLAB, Newport News, Virginia
  
 

The operation of the RHIC facility at BNL and the Electron Ion Colliders (EIC) under development at Jefferson Laboratory and BNL need high brightness ion beams with the highest polarization. Charge exchange injection into a storage ring or synchrotron and Siberian snakes have the potential to handle the needed polarized beam currents, but first the ion sources must create beams with the highest possible polarization to maximize collider productivity, which is proportional to a high power of the polarization. We are developing one universal H-/D- ion source design which will synthesize the most advanced developments in the field of polarized ion sources to provide high current, high brightness, ion beams with greater than 90% polarization, good lifetime, high reliability, and good power efficiency. The new source will be an advanced version of an atomic beam polarized ion source (ABPIS) with resonant charge exchange ionization by negative ions. An integrated ABPIS design will be prepared based on new materials and an optimized magnetic focusing system. Polarized atomic and ion beam formation, extraction, and transport for the new source will be computer simulated.

  
THPEC072 High Brightness Surface Plasma Sources of Negative Hydrogen Ions 4223
 
  • V.G. Dudnikov, R.P. Johnson
    Muons, Inc, Batavia
  • M.P. Stockli, R.F. Welton
    ORNL, Oak Ridge, Tennessee
  
 

Development of novel modifications of H- source designs is proposed. The new source will be an advanced version of a Penning DT SPS (Dudnikov-Type Penning Surface Plasma Source) which will generate brighter beam in noiseless discharge, deliver up to 20 mA average current with better electrode cooling using new materials, and have longer lifetime, fast beam chopping capability, and reduced cesium loss.

  
THPEC073 RF H- Ion Source with Saddle Antenna 4226
 
  • V.G. Dudnikov, R.P. Johnson
    Muons, Inc, Batavia
  • G. Dudnikova
    UMD, College Park, Maryland
  • M.P. Stockli, R.F. Welton
    ORNL, Oak Ridge, Tennessee
  
 

In this project we are developing an RF H- surface plasma source which will synthesize the most important developments in the field of negative ion sources to provide high pulsed and average current, high brightness, good lifetime, high reliability, and higher power efficiency. We describe two planned modifications to the present SNS external antenna source in order to increase the plasma density near the output aperture: 1) replacing the present 2 MHz plasma-forming solenoid antenna with a 13 MHz saddle-type antenna and 2) replacing the permanent multicusp magnetic system with a weaker electro-magnet. Progress of this development will be presented.